The complexity varies from a single contact mask to a mask-set for resist and "Process Control Modules" used for CMOS.
After validating a design using software tools it is transcripted to a suitable format which can be used in mask manufacturing equipment or other applications.
Dependent of complexity and sizing, photo-masks can be made by external manufacturers, on substrates like quartz-glass plates, Soda-Lime glass plates or synthetic foil.

Also it is possible to write directly into photo-resist on wafers, this can be done on the Electron Beam Pattern Generator in WAG.

Another application is to cut a pattern out of a metal-plate using laser-technology.
Due to the effects of wafer processing, such as under-etching, corrections must be made to the design to realize the right dimensions in the final product.

For designing of photo-masks, generating files for laser equipment, pick & place equipment etc. the customer is always welcome.
Also we will advise, and assist by orders for masks and contacting mask-suppliers.